Loss Stress Photopatternable Dielectric: PDM-5022

PDM-5022 is a spin-coatable, photopatternable dielectric for redistribution layers.

FeaturesPDM-5022

  • Photopatternable
  • Low cure temperature
  • Low wafer stress
  • NMP-free dielectric
  • High dielectric breakdown strength
  • Adhesion to metals

Overview

PDM-5022 is a dielectric material with an exceptionally high breakdown strength. It is also NMP-free, which simplifies regulatory compliance.

Dielectric materials also need to endure the stresses associated with device packaging. The heat generated at the time of component packaging can cause substrate warpage. This then causes stress on the component joints, decreasing packaging and product reliability.

PDM-5022 has been utilized to minimize stress caused by polymer coatings.  Typical materials like polyimide have a high modulus and a high cure temperature, which causes the material to shrink. This is counter-productive to low wafer stress.

By employing a non-shrinking, low cure temperature (180 ̊C) mechanism in combination with low modulus (1.2 GPa), PDM-5022 was designed to reduce wafer curvature (15 μm; 7 MPa stress) and reduce overall package stress.

These attributes make PDM-5022 a suitable dielectric for advanced packaging applications that require low stress and high thermal stability.

 

 PDM-5022-2

 

Properties

Tensile Strength 27 MPa
Modulus 1.2 GPa
Elongation 24%
Glass Transition Temperature (Tg) 280 ̊C
Coefficient of Thermal Expansion (CTE) 212 ppm
5% and 95% Weight Loss 286 ̊C and 514 ̊C
Dielectric Constant 2.7 at 1 MHz
Dielectric Breakdown Strength 420kV/mm
Moisture Uptake 0.1%
Wafer Warpage 15.7 µm
Internal Stress 7 MPa
Chemical Resistance Good
Adhesion to Metals Excellent

 

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