Promerus’ PDM-5040 photoresist has high etch resistance to reduce line edge roughness.
Features
Overview
PDM-5040 photoresist is based on cyclic olefin polymer (COP) technology.
With proprietary techniques to polymerize COP, the alicyclic backbone is inherently resistant to the dry-etch conditions without the need to modify pendant functionality.
This etch resistance, coupled with the ability to control end group functionalities, leads to a photoresist with a natural improvement to line-edge roughness (LER).
Properties
Resist Thickness | 225nm |
PAB | 95 ̊C for 60s |
Illumination | 193nm, NA 0.60, 2/3 Annular |
Reticle | 6%HT |
PEB | 95 ̊ C for 60s |
Development | 0.26N TMAH, 30s |
Target Pattern | 120nm L/S |
Promerus is a technology-driven organization providing advanced material solutions for the next generation of applications. These materials are based on high-purity cyclic olefin polymers that provide outstanding electrical, mechanical, optical and thermal properties. For more information, fill out the form below to explore our full list of materials and applications
Download the full materials guide to uncover the appropriate materials for your application.
This free guide to Promerus’ materials and applications is designed to help you better understand your options when it comes to polymer application requirements. Additionally, the guide will help you:
Ready to take the next step? Fill out the form below.