Topcoat Polymer for Immersion Lithography: PDM-5049

Promerus’ PDM-5049 topcoat achieves both high water contact angles and fast dissolution rates in TMAH developer.

FeaturesPDM-5049

  • Hydrophobic
  • TMAH-soluble
  • Useful in immersion lithography

Overview 

The resolution of photoresists is limited by Rayleigh’s Equation, which is proportional to the wavelength of light and numerical aperture of the lens.

However, the numerical aperture increases when putting high refractive index fluids, like water, in contact with the lens. In this approach, a protective topcoat is needed to protect the lens from additives that can migrate out of the photoresist into the water layer.

Promerus developed a hydrophobic topcoat that prevents the water defects often associated with these topcoats. And additionally, this topcoat quickly dissolves in TMAH developer during the photoresist develop step, so no extra processing is required.

 

PDM-5049-2

PDM-5049-3

 

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